ÖÐÎİæ
 
Index
 
Introduction
 
Product
 
News
 
Services
 
Development
 
Feedback
 
Contact us
 
 
Home > Development > Shanghai R&D Center
 
 

¡¡¡¡Z-OBEE Shanghai R&D Center was established at the beginning of 2005, and located in the CBD of Lu Jiazui, Shanghai. The company is engaged in R&D of GSM/GPRS2.5G mobile terminals with complete use rights to Skyworks¡¯ cellphone solution and technical support, and its main R&D personnel possess rich specialized experiences of over 8 years on an average basis. It is capable of providing total mobile terminal solutions including ID/MD, HW, SW, Manufacturing, TE, QA etc., as well as FTA/CTA/EMC full-process technical support, enabling R&D design and quality assurance for cellphone products. There are complete equipments in the laboratory, where various aspects of a cellphone can be tested.

¡¡¡¡Z-OBEE Shanghai R&D Center enjoys a great number of advantages during research and development process, namely hardware advantages, software advantages and production line advantages etc.

¡¡¡¡Hardware advantages: Adopts Skyworks¡¯ latest chipset solution technical platform, which conforms to the mainstream of technical development; high degree of component integration; strong main board expandability, which enables designs of various grades from GSM low-end cellphones to high-end GPRS/handwriting cellphones by supporting different component configurations.

¡¡¡¡Software advantages: MMI software adopts standard event-handling mechanism with clear architecture and division of work; extremely familiar with bottom layer of Skyworks, rich debugging experience, and successful debugging experience in mainstream multimedia chipsets currently on the market.

¡¡¡¡Production line advantages: Short time in main board calibration and integrated testing; low investment in production line instruments; supports many-in-one testing method that yields high productivity; the main board adopts fully shielded design, which replaces unstable shielding methods such as conductive paint, conductive adhesive etc.; low relevance of the performance of the whole machine to structural components, which reduces the risk of shielding interference.

 
 
Shanghai R&D Center
Shenzhen R&D Center
 
 
Services | Development | Feedback | Candidates | Contact Us
CopyRight © 2007 Z-OBEE All Rights Reserved.
ÔÁICP±¸05077864ºÅ